KEY FEATURES

High Performance Electron Optics

• High brightness Schottky emitter for high-resolution/high current/low-noise imaging
• Unique Wide Field Optics™ design with a proprietary Intermediate Lens (IML) offering a variety of working and displaying modes, for instance with enhanced field of view or depth of focus, etc.
• Real time In-Flight Beam Tracing™ for performance and beam optimization, integrated with the well-established software Electron Optical Design. It also includes a direct and continuous control of the beam spot size and beam current.
• Beam Deceleration Technology (BDT) for excellent resolution at low beam voltages·
• Excellent imaging at short working distances with the powerful In-Beam detector (optional)
• All MIRA3 chambers provide superior specimen handling using a 5-axis fully motorized compucentric stage and have ideal geometry for EDX and EBSD
• Optional extra-large chambers (XM, GM) with robust stages able to accommodate large samples including large wafers (6", 8", 12") are also available

High Performance Ion Optics

• Sophisticated high performance CANION-FIB system for fast and precise cross-sectioning and TEM sample preparation.
• Optional ultra-high resolution COBRA-FIB column represents the highest level of technology in terms of resolution both for imaging and milling. This is one of the most precise FIB instruments for nano-engineering in the world.