KEY FEATURES
Specification
Electron Optics | |
---|---|
Electron Gun | High brightness Schottky emitter |
Resolution | |
Standard mode In-Beam SE | 0.7nmat15keV 1.4nmat1keV |
Beam Deceleration Mode (Option) |
1.0nm at 1 keV - SE (BDM) |
Magnification at 30keV | 4 x - 1,000,000 x |
Probe Current | 2 pA to 400 nA |
Xe plasma ion source FIB column for achieving the most challenging large-scale milling tasks in unbeatable short times frames
Ion Optics
Ion column | HR i-FIB | i-FIB |
---|---|---|
Ion Gun | Xe plasma ion source | |
Accelerating voltage | 3kV to 30kV | |
Probe current | 1 pA to 1 µA | 1 pA to 2 µA |
Resolution (at 30 keV) | < 15 nm | < 25 nm |
Magnification | Minimum 150 × at coincidence point and 10 kV (corresponding to 1 mm field of view), maximum 1,000,000 × | |
SEM-FIB coincidence at | WD 9 mm (FERA3) / WD 5 mm (XEIA3) for SEM – WD 12 mm for FIB | |
SEM-FIB angle | 55° |